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John H. Weaver
Donald B. Willett Professor, Professor of Materials Science and Engineering, Professor of Physics
Office 262 Frederick Seitz Materials Research Laboratory
Telephone 217-244-3528 Fax 217-333-2736
Mail Address Department of Materials Science and Engineering
1304 W. Green St., Urbana, IL 61801
See Weaver Resume for complete list
Swaminathan, P., V.N. Antonov, J.A.N.T. Soares, J.S. Palmer, and J.H. Weaver, "Cd-based II-VI Semiconductor Nanostructures Produced by Buffer Layer Assisted Growth: Structural Evolution and Photoluminescence," Phys. Rev. B 73 (2006): 125430.
Trenhaile, B.R., V.N. Antonov, G.J. Xu, A. Agrawal, A.W. Signor, R. Butera, K.S. Nakayama, and J.H. Weaver, "Phonon-Activated, Electron-Stimulated Desorption of Halogens from Si(100)-(2x1)," Phys. Rev. B 73 (2006): 125318.
Antonov, V.N., P. Swaminathan, J.A.N.T. Soares, J.S. Palmer, and J.H. Weaver, "Photoluminescence of CdSe Quantum Dots and Rods from Buffer-Layer-Assisted Growth," Appl. Phys. Lett. 88, (2006): 121906.
Nakayama, K.S., M.M.G. Alemany, H. Kwak, T. Sugano, K. Ohmori, J.R. Chelikowsky, and J.H. Weaver, “Electronic Structure of Si(001)-c(4x2) Analyzed by Scanning Tunneling Spectroscopy and ab initio Simulations,” Phys. Rev. B 73 (2006): 035330.
Nakayama, K.S., T. Sugano, K. Ohmori, A.W. Signor, and J.H. Weaver, “Chemical Fingerprinting at the Atomic Level with Scanning Tunneling Spectroscopy,” Surf. Sci. 600 (2006): 716-23.
Waggoner, P.S., J.S. Palmer, V.N. Antonov, and J.H. Weaver, “Metal Nanostructure Growth on Buffer Layers of Molecular CO2,” Surf. Sci. 596 (2005): 12-20.
Palmer, J.S., V.N. Antonov, A.S. Bhatti, P. Swaminathan, P.S. Waggoner, and J.H. Weaver, "The Effects of Buffer Structure on Buffer-Layer-Assisted Growth: Grain Boundaries, Grooves and Pattern Transfer," Surf. Sci. 595 (2005): 64-72.
Trenhaile, B.R., V.N. Antonov, G.J. Xu, K.S. Nakayama, and J.H. Weaver, “Electron Stimulated Desorption from a Surprising Source: Internal Hot Electrons for Br-Si(100)-(2x1),” Surf. Sci. Lett. 583/1, L135-L141, accompanied by Perspective by R.J. Hamers, “Bond-breaking at Surfaces: Electrons or Phonons?” See also Physics Update “A New Mode for Desorption,” Physics Today 58, no. 9 (2005): 9; Editor’s Choice, “Not-So-Thermal Desorption,” Science 308 (2005): 604; News of the Week, “Surface Bonding Reconsidered,” C&E News 83 (2005): 7; and Chemical Highlights of 2005, C&E News 83 (2005): 20.
Antonov, V.N., J.S. Palmer, P.S. Waggoner, A.S. Bhatti, and J.H. Weaver, "Nanoparticle diffusion on desorbing solids: The role of elementary excitations in buffer-layer-assisted growth," Phys. Rev. B 70 (2004): 45406.
Weaver, J.H., and V.N. Antonov, "Synthesis and patterning of nanostructures of (almost) anything on anything," Surface Science 557 (2004): 1. See also C&E News May 3, 2004 http://pubs.acs.org/cen/news/8218/8218notw1.html.
Xu, G.J., S.V. Khare, Koji S. Nakayama, C.M. Aldao, and J.H. Weaver, "Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K," Physical Review B 68 (2003): 235318.
Antonov, V.N., J.S. Palmer, A.S.Bhatti, and J.H. Weaver, "Nanostructure diffusion and aggregation on desorbing rare gas solids: Slip on an incommensurate lattice," Phys. Rev. B 68 (2003): 205418.
Xu, G.J., E. Graugnard, B.R. Trenhaile, K.S. Nakayama, and J.H. Weaver, "Atom vacancy lines and surface patterning: The role of stress for Br-Si(100)-(2x1) at 700 K," Phys. Rev. B 68 (2003): 75301.
Xu, G.J., E. Graugnard, V. Petrova, K.S. Nakayama, and J.H. Weaver, "Dynamic roughening of Cl-terminated Si(100)-(2x1) at 700 K," Phys. Rev. B 67 (2003): 125320.
Xu, G.J., K.S. Nakayama, B.R. Trenhaile, C.M. Aldao, and J.H. Weaver, "Equilibrium morphologies for Cl-roughened Si(100) at 700 K: Dependence on Cl concentration," Phys. Rev. B 67 (2003): 125321.
Haley, C., and J.H. Weaver, "Buffer-layer-assisted nanostructure growth via two dimensional cluster-cluster aggregation," Surf. Sci. 518 (2002): 243.
Nakayama, K.S., E. Graugnard, and J.H. Weaver, "Tunneling electron induced Br hopping on Si(100)-(2x1)," Phys. Rev. Lett. 89 (2002): 266106.
Nakayama, K.S., E. Graugnard, and J.H. Weaver, "Surface modification without desorption: Recycling of Cl on Si(100)-2x1," Phys. Rev. Lett. 88 (2002): 125508. See also C&E News 80 (March 25, 2002): 38.
Aldao, C.M., and J.H. Weaver, "Halogen etching of Si via atomic-scale processes," Progress in Surface Science 68 (2001): 189.
Evans, M.M.R., B.Y. Han, and J.H. Weaver, "Ag films on GaAs(110): Dewetting and void growth," Surf. Sci. 465 (2000): 90.
Nakayama, K., C.M. Aldao, and J.H. Weaver, "Vacancy-assisted halogen etching Si(100)-2x1," Phys. Rev. Lett. 82 (1999): 568.
Chey, S.J., L. Huang, and J.H. Weaver, "Self-assembly of multilayer arrays from Ag nanoclusters delivered to Ag(111) by soft landing," Surf. Sci. Lett. 419 (1999): L100.
Nakayama, K., and J.H. Weaver, "Electron-stimulated modification of Si Surfaces," Phys. Rev. Lett. 82 (1999): 980.
Chey, S.J., L. Huang, and J.H. Weaver, "Interface bonding and manipulation of Ag and Cu nanocrystals on Si(111)-(7x7)-based surfaces," Phys. Rev. B 59 (1999): 16033.
Boland, J.J., and J.H. Weaver, "A surface view of etching," Physics Today 51 (1998): 34.
Huang, L., S.J. Chey, and J.H. Weaver, "Buffer-layer-assisted growth of nanocrystals: Ag-Xe-Si(111)," Phys. Rev. Lett. 80 (1998): 4095.
Chey, S.J., L. Huang, and J.H. Weaver, "Manipulation and writing with Ag nanocrystals on Si(111)-7x7," Appl. Phys. Lett. 21 (1998): 2698.
Han, B.Y., C.Y. Cha, and J.H. Weaver, "Layer-by-layer etching of GaAs(110) with halogenation and pulsed-laser irradiation," J. Vac. Sci. Technol. A 16 (1998): 490.
Cha, C.Y., J. Brake, B.Y.Han, D.W. Owens, and J.H. Weaver, "Surface morphologies associated with thermal desorption: Scanning tunneling microscopy studies of Br-GaAs(110)," J. Vac. Sci. Technol. B 15 (1997): 605.
Poirier, D.M., and J.H. Weaver, "Solid state properties of fullerenes and fullerene-based materials," Chapter 1 in Fullerene Fundamentals, Solid State Physics 48, eds. H. Ehrenreich and F. Spaepen, Academic Press, Cambridge, 1994.